Gigaphoton Inc., a manufacturer of light sources for semiconductor lithography, has developed hTGM for ArF, an on-site neon gas recycling system designed for ArF excimer lasers used in semiconductor manufacturing.
ArF lithography is widely used in the production of advanced semiconductors, where stable laser operation and reliable access to rare gases are important for maintaining manufacturing output.
Addressing Neon Supply Risks
Neon supply has faced increased volatility in recent years amid geopolitical risks and disruptions across global supply chains. Gigaphoton has previously developed gas reduction technologies and recycling systems for krypton fluoride (KrF) excimer lasers.
The new hTGM for ArF extends the company’s gas recycling technology to ArF lithography. The system collects and recycles used gas within semiconductor fabrication facilities, reducing dependence on external gas supplies.
According to Gigaphoton, a single hTGM for ArF unit can reduce gas consumption by up to 470 kiloliters annually and can be connected to as many as five ArF excimer lasers.
The system also incorporates hardware commonality with Gigaphoton’s hTGM for KrF, which the company said can support more efficient production ramp-up.
Focus on Supply Chain Resilience
Gigaphoton President and CEO Tatsuo Enami said combining gas-consumption reduction technologies with on-site recycling could help semiconductor manufacturers mitigate risks associated with rare-gas procurement.
The company said the technology is intended to support stable fab operations while strengthening resilience across the semiconductor supply chain.
